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KMID : 0372920010220020145
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Journal of Biomedical Engineering Research
2001 Volume.22 No. 2 p.145 ~ p.150
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Fabrication of Depth Probe Type Semiconductor Microelectrode Arrays for Neural Recording Using Both Dry and wet Etching of Silicon
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신동용
윤태환/황은정/오승재/신형철/김성준
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Abstract
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Semiconductor microelectrode array;Cerebral cortex;LTO(low temperature oxide) mask;Shank thickness;Simultaneous recordings
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KEYWORD
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